HOME > 口頭発表 > 書誌詳細Formation of Isotope Controlled SiC Thin Film by Plasma Chemical Vapor Deposition and its CharacterizationSUZUKI, Hiroshi. APF-9. 2004.NIMS著者鈴木 裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2022-09-05 11:31:53 +0900更新時刻: 2022-09-05 11:31:53 +0900
