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Nitride film Growth by Near-Atmospheric Nitrogen Plasma-Assisted Chemical Vapor
(窒素大気圧プラズマＣＶＤによる窒化物薄膜成長)
第19回日本MRS学術シンポジウム. December 07, 2009-December 09, 2009. Invited
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2022-09-05 12:26:50 +0900 Updated at: 2024-03-05 11:42:42 +0900