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フラッシュメモリにおけるトンネル層界面の硬Ｘ線XPS解析
(Interface Structure of Tunnel Oxynitride for Flash Memory Studied by Hard X-ray Photoelectron Spectroscopy)
International Workshop on Hard X-ray Photoelectron Spectroscopy. September 19, 2006-September 20, 2006.
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Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 04:12:34 +0900Updated at: 2017-07-10 19:46:04 +0900