Self-aligned photolithography using backside exposure through metal patterns on β-Ga2O3 substrates
The 4th International Workshop on Gallium Oxide and Related Materials. 2022.
NIMS著者
Materials Data Repository (MDR)上の本文・データセット
作成時刻: 2022-11-02 03:25:17 +0900更新時刻: 2022-11-02 03:25:17 +0900