Growth of orientation-controlled ferroelectric HfO2 thin films for next generation ferroelectric devices

Hiroshi Funakubo, Takanori Mimura, Kiriha Katayama, Takao Shimizu, Hiroshi Uchida, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, 坂田修身.

ISTDM2016/ISCSI-VII. 2016. 招待講演

作成時刻: 2017-02-14 11:25:16 +0900更新時刻: 2024-03-05 11:46:14 +0900