HOME > Presentation > DetailCharacteristics of Broad-Band Frequency Low Pressure Inductively Coupled Plasma Used for Nanostructured Carbon Deposition(微細構造炭素製膜用広帯域周波数低圧誘導結合プラズマの特性)OKADA, Katsuyuki. 16th International Symposium on Plasma Chemistry. June 22, 2003-June 27, 2003.NIMS author(s)OKADA, KatsuyukiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2022-09-05 11:23:58 +0900 Updated at: 2022-09-05 11:23:58 +0900