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イットリア添加によるハフニウムアルミネート膜中の欠陥の減少
(Reduction of vacancy-type defects in hafnium aluminate film by yttria addition)
第64回応用物理学会学術講演会. August 30, 2003-September 02, 2003.
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Created at: 2017-02-14 11:24:20 +0900 Updated at: 2017-07-10 18:55:37 +0900