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MoS2 ウエハー上high-k 堆積で理想的な界面形成は可能か？
(Stability of high-k dielectric films deposited on MoS2 wafers)
第86回応用物理学会秋季学術講演会. September 07, 2025-September 10, 2025.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2025-09-18 03:12:51 +0900 Updated at: 2025-09-18 03:12:51 +0900