HOME > Presentation > Detail熱ALD及びPE-ALD法で形成したHigh-k絶縁膜(High-k insulating film fabricated by thermal-ALD and PE-ALD)生田目 俊秀. 2017年真空・表面科学合同講演会. August 17, 2017-August 19, 2017. InvitedNIMS author(s)NABATAME, ToshihideFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-05-02 22:58:51 +0900Updated at: 2024-03-05 12:20:03 +0900