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スパッタリング法によるシリコン基板上への高Sc濃度ScAlNの製膜
(Preparation of High Sc concentration ScAlN on Si substrate by sputtering method)
第87回応用物理学会秋季学術講演会. September 08, 2026-September 11, 2026.
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Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2026-10-31 03:07:46 +0900 Updated at: 2026-10-31 03:07:46 +0900