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NIMS Award Symposium 2026

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Carbon-Rich SiOCH Films with Hydrocarbon Network Bonds for Low-k Dielectrics:First-Principles Investigation
(低誘電率材料のための、炭素含有量が多く炭化水素ネットワーク結合を有するSiOCH膜:第一原理的研究)

2006 International Interconnect Technology Conference. June 05, 2006-June 07, 2006.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2022-09-05 11:50:55 +0900 Updated at: 2022-09-05 11:50:55 +0900

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