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Hydrogen-boron complexes in heavily boron doped silicon treated with high concentration of hydrogen atoms
(高濃度水素原子処理された高濃度ボロンドープシリコン中の水素－ボロン複合体)
The 23rd International conference on defects in semiconductors. July 24, 2005-July 29, 2005.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2022-09-05 11:43:08 +0900 Updated at: 2022-09-05 11:43:08 +0900