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Impacts of oxidant selection and oxidant exposure time in ALD growth on crystallization of as-deposited HZO thin films
2025 International Workshop on Dielectric Thin Films for Future Electron Devices –Science and Technology– (IWDTF 2025). November 05, 2025-November 07, 2025.
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Created at: 2026-06-18 03:06:26 +0900 Updated at: 2026-06-18 03:06:26 +0900