HOME > Presentation > Detailアトムプローブ法によるGe/Siコアシェルナノワイヤ中の不純物分布(Dopant Distribution in Ge / Si Core-Shell Nanowires Investigated by Atom Probe Tomography)Bin Han, 清水康雄, 井上耕治, ジェバスワン ウイパコーン, 深田 直樹, 永井康介. 2015 MRS Fall Meeting. November 29, 2015-December 04, 2015.NIMS author(s)JEVASUWAN, WipakornFUKATA, NaokiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-01-08 03:58:14 +0900 Updated at: 2017-07-10 22:20:07 +0900