HOME > Published patent applications > Detail
[Published patent application] 高記録密度磁性層用材料、磁気抵抗記憶素子、及び高記録密度磁性層用材料の製造方法
NIMS author(s)
Created at :2024-09-18 03:17:01 +0900 Updated at :2024-09-18 03:17:01 +0900
HOME > Published patent applications > Detail
