HOME > その他の文献 > 書誌詳細High-Rate Deposition of High-Quality, Thick Cubic Boron Nitride Films by Bias-Assisted DC Jet Plasma Chemical Vapor Deposition松本精一郎, ZHANG Wen, 松本精一郎, ZHANG Wen. JAPANESE JOURNAL OF APPLIED PHYSICS [39] 442. 2000.NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2020-11-20 10:34:39 +0900 更新時刻: 2020-11-20 10:34:39 +0900
