High-Rate Deposition of High-Quality, Thick Cubic Boron Nitride Films by Bias-Assisted DC Jet Plasma Chemical Vapor Deposition | SAMURAI, NIMS Researchers Directory Service

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High-Rate Deposition of High-Quality, Thick Cubic Boron Nitride Films by Bias-Assisted DC Jet Plasma Chemical Vapor Deposition

松本精一郎, ZHANG Wen, 松本精一郎, ZHANG Wen.

JAPANESE JOURNAL OF APPLIED PHYSICS [39] 442. 2000.

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2020-11-20 10:34:39 +0900 Updated at: 2020-11-20 10:34:39 +0900

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