HOME > Misc > DetailInelastic Processes in a Low Pressure Inductively Coupled CH4/H2 PlasmaOKADA, Katsuyuki, KOMATSU, Shojiro, MATSUMOTO, Seiichiro. Proceedings of ISPC-18 9999-9999. 2007.NIMS author(s)OKADA, KatsuyukiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2022-09-05 12:02:11 +0900 Updated at: 2022-09-05 12:02:11 +0900
