Numerical Simulation of Low Pressure Inductively Coupled Plasma Used for Nanocrystalline Diamond Deposition | SAMURAI, NIMS Researchers Directory Service

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Numerical Simulation of Low Pressure Inductively Coupled Plasma Used for Nanocrystalline Diamond Deposition

OKADA, Katsuyuki, KOMATSU, Shojiro, MATSUMOTO, Seiichiro.

Proceedings of Inter. COE Forum Plasma Sci. Technol. 159-160. 2004.

NIMS author(s)

OKADA, Katsuyuki

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2022-09-05 11:36:41 +0900 Updated at: 2022-09-05 11:36:41 +0900

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