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Oxidation Rate and Surface Potential Variations of Silicon During the Plasma Oxidation
(プラズマ酸化によるシリコンの酸化速度と表面電位変動)

M. Kitajima, 上岡功, 中村一隆, S. Hishita, I. Kamioka, K. G. Nakamura.
Physical Review B 53 [7] 3993-3999. 1996.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2020-11-20 10:36:07 +0900Updated at: 2024-04-02 00:06:09 +0900

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