Siナノ細線への熱酸化応力誘起とフォノン閉じ込め効果
(Introduction of stress and phonon confinement in thermally oxidized silicon nanowires)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2022-09-05 11:55:42 +0900 Updated at: 2022-09-05 11:55:42 +0900