高周波シランガスプラズマを用いた高品質微結晶シリコン薄膜の高速作製
(High-rate-growth of high-quality microcrystalline silicon films by very-high-frequency SiH4/H2 plasma)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 04:03:37 +0900Updated at: 2017-04-06 20:03:32 +0900