HOME > 論文 > 書誌詳細The rate limiting process and its activation energy in the forming process of a Cu/Ta2O5/Pt gapless-type atomic switchYuki Shigeoka, Tohru Tsuruoka, Tsuyoshi Hasegawa. Japanese Journal of Applied Physics 57 [3] 035202. 2018.https://doi.org/10.7567/jjap.57.035202 NIMS著者鶴岡 徹Materials Data Repository (MDR)上の本文・データセット作成時刻: 2018-02-23 20:54:04 +0900更新時刻: 2024-04-01 22:32:59 +0900
