HOME > 論文 > 書誌詳細Evaluation of band offset at amorphous-Si/BaSi2 interfaces by hard x-ray photoelectron spectroscopyRyota Takabe, Hiroki Takeuchi, Weijie Du, Keita Ito, Kaoru Toko, Shigenori Ueda, Akio Kimura, Takashi Suemasu. Journal of Applied Physics 119 [16] 165304. 2016.https://doi.org/10.1063/1.4947501 NIMS著者上田 茂典Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 18:10:06 +0900更新時刻: 2024-12-09 04:58:41 +0900
