HOME > Article > DetailEvaluation of band offset at amorphous-Si/BaSi2 interfaces by hard x-ray photoelectron spectroscopyRyota Takabe, Hiroki Takeuchi, Weijie Du, Keita Ito, Kaoru Toko, Shigenori Ueda, Akio Kimura, Takashi Suemasu. Journal of Applied Physics 119 [16] 165304. 2016.https://doi.org/10.1063/1.4947501 NIMS author(s)UEDA, ShigenoriFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 18:10:06 +0900Updated at: 2025-01-10 05:04:07 +0900
