HOME > 論文 > 書誌詳細Segregation mechanism of arsenic dopants at grain boundaries in siliconYutaka Ohno, Tatsuya Yokoi, Yasuo Shimizu, Jie Ren, Koji Inoue, Yasuyoshi Nagai, Kentaro Kutsukake, Kozo Fujiwara, Atsutomo Nakamura, Katsuyuki Matsunaga, Hideto Yoshida. Science and Technology of Advanced Materials: Methods 1 [1] 169-180. 2021.https://doi.org/10.1080/27660400.2021.1969701 Open Access Informa UK Limited (Publisher) NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2021-10-26 03:34:08 +0900更新時刻: 2024-03-31 13:33:32 +0900
