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Suppression of Fermi Level Pinning and Flat Band Voltage Shift by Inserting Diamond-Like Carbon at a High-k/SiO2Interface in a Gate Stack Structure
(Suppression of Fermi Level Pinning and Flat Band Voltage Shift by Inserting Diamond-Like Carbon at a High-k/SiO2Interface in a Gate Stack Structure)

Yuta Iwashita, Tetsuya Adachi, Kenji Itaka, Atsushi Ogura, Toyohiro Chikyow.

NIMS著者


    Materials Data Repository (MDR)上の本文・データセット


      作成時刻: 2016-05-24 16:18:14 +0900 更新時刻: 2026-10-08 05:32:21 +0900

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