Implantation of 60 keV copper negative ion into thin SiO2 films on Si: Thermal stability of Cu nanoparticles and recovery of rad
(Si上のSiO2薄膜への60keV負イオン注入：Cuナノ粒子の熱安定性と照射欠陥の回復)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2016-05-24 11:56:17 +0900 Updated at: 2026-09-28 04:16:23 +0900