HOME > Article > DetailEffects of Aspect Ratio of Photoresist Patterns on Adhesive Strength between Microsized SU-8 Columns and Silicon Substrate under Bend Loading ConditionChiemi Ishiyama, Akinobu Shibata, Masato Sone, Yakichi Higo. Japanese Journal of Applied Physics 49 [6] 06GN14. 2010.https://doi.org/10.1143/jjap.49.06gn14 NIMS author(s)SHIBATA, AkinobuFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2020-10-02 09:10:32 +0900Updated at: 2024-04-02 01:08:26 +0900