Effects of Aspect Ratio of Photoresist Patterns on Adhesive Strength between Microsized SU-8 Columns and Silicon Substrate under Bend Loading Condition | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Effects of Aspect Ratio of Photoresist Patterns on Adhesive Strength between Microsized SU-8 Columns and Silicon Substrate under Bend Loading Condition

Chiemi Ishiyama, Akinobu Shibata, Masato Sone, Yakichi Higo.

Japanese Journal of Applied Physics 49 [6] 06GN14. 2010.

https://doi.org/10.1143/jjap.49.06gn14

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作成時刻: 2020-10-02 09:10:32 +0900更新時刻: 2024-04-02 01:08:26 +0900

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