HOME > 論文 > 書誌詳細Phosphorus ion implantation in silicon nanocrystals embedded in SiO2(SiO2中に埋め込まれたSiナノ結晶へのPイオン注入)Kouichi Murakami, Ryota Shirakawa, Masatoshi Tsujimura, Noriyuki Uchida, Naoki Fukata, Shun-ichi Hishita. Journal of Applied Physics 105 [5] 054307. 2009.https://doi.org/10.1063/1.3088871 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 15:49:39 +0900更新時刻: 2024-03-31 17:45:57 +0900
