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Phosphorus ion implantation in silicon nanocrystals embedded in SiO2
(SiO2中に埋め込まれたSiナノ結晶へのPイオン注入)

Kouichi Murakami, Ryota Shirakawa, Masatoshi Tsujimura, Noriyuki Uchida, Naoki Fukata, Shun-ichi Hishita.

Journal of Applied Physics 105 [5] 054307. 2009.

https://doi.org/10.1063/1.3088871

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 15:49:39 +0900Updated at: 2024-05-01 08:57:17 +0900

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