SAMURAI - NIMS Researchers Database

HOME > 論文 > 詳細

論文の表示

著者名Yoshiyuki Yamashita, Hideki Yoshikawa, Toyohiro Chikyo.
タイトルBias dependent potential distribution of a Pt/HfO2/SiO2/Si gate structure obtained from a bias application in hard X-ray photoelectron spectroscopy
掲載誌名Japanese Journal of Applied Physics 53 [5S1] 05FH05
ISSN: 13474065 00214922
発表年2014
言語English
ESIでのカテゴリPHYSICS
DOIhttps://doi.org/10.7567/jjap.53.05fh05
この文献をMendeleyにインポートMendeley

▲ページトップへ移動