Bias dependent potential distribution of a Pt/HfO2/SiO2/Si gate structure obtained from a bias application in hard X-ray photoelectron spectroscopy
(Bias dependent potential distribution of a Pt/HfO2/SiO2/Si gate structure obtained from a bias application in hard X-ray photoelectron spectroscopy)
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Materials Data Repository (MDR)上の本文・データセット
作成時刻: 2016-05-24 17:23:54 +0900更新時刻: 2024-03-31 14:21:03 +0900