Holographic interferometric microscopy for measuring Cu2+ concentration profile during Cu electrodeposition in a magnetic field
(磁場中の銅電析に伴う銅イオン濃度分布の干渉計測定)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2019-03-01 12:16:07 +0900 Updated at: 2026-11-08 05:05:39 +0900