Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma | SAMURAI, NIMS Researchers Directory Service

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Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma

Fumikazu Mizutani, Shintaro Higashi, Mari Inoue, Toshihide Nabatame.

AIP Advances 9 [4] 045019. 2019.

https://doi.org/10.1063/1.5081727

Open Access AIP Publishing (Publisher)

NIMS author(s)

NABATAME, Toshihide

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2019-04-23 03:00:23 +0900Updated at: 2024-05-01 04:50:10 +0900

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