HOME > 論文 > 書誌詳細Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasmaFumikazu Mizutani, Shintaro Higashi, Mari Inoue, Toshihide Nabatame. AIP Advances 9 [4] 045019. 2019.https://doi.org/10.1063/1.5081727 Open Access AIP Publishing (Publisher) NIMS著者生田目 俊秀Materials Data Repository (MDR)上の本文・データセット作成時刻: 2019-04-23 03:00:23 +0900更新時刻: 2024-03-31 00:56:07 +0900
