HOME > 論文 > 書誌詳細Microstructure evolution of Ge+ implanted silicon oxide thin films upon annealing treatmentsR.S. Yu, Masaki Maekawa, Atsuo Kawasuso, SEKIGUCHI, Takashi, B.Y. Wang, X.B. Qin, Q.Z. Wang. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 3097-3099. 2009.NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2022-10-21 23:32:26 +0900更新時刻: 2022-10-21 23:32:26 +0900
