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Bayesian Optimization for Controlled Chemical Vapor Deposition Growth of WS2

Feng Zhang, Ryo Tamura, Fanyu Zeng, Daichi Kozawa, Ryo Kitaura.
ACS Applied Materials & Interfaces 16 [43] 59109-59115. 2024.
https://doi.org/10.1021/acsami.4c15275

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    作成時刻: 2024-11-27 17:35:27 +0900更新時刻: 2024-12-29 04:30:06 +0900

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