HOME > 論文 > 書誌詳細Bayesian Optimization for Controlled Chemical Vapor Deposition Growth of WS2Feng Zhang, Ryo Tamura, Fanyu Zeng, Daichi Kozawa, Ryo Kitaura. ACS Applied Materials & Interfaces 16 [43] 59109-59115. 2024.https://doi.org/10.1021/acsami.4c15275 Open Access American Chemical Society (ACS) (Publisher) Materials Data Repository (MDR) NIMS著者田村 亮曽 繁宇小澤 大知北浦 良Materials Data Repository (MDR)上の本文・データセットMDRavailable Bayesian Optimization for Controlled Chemical Vapor Deposition Growth of WS2 作成時刻: 2024-11-27 17:35:27 +0900 更新時刻: 2026-02-12 04:33:02 +0900
