HOME > Article > DetailBayesian Optimization for Controlled Chemical Vapor Deposition Growth of WS2Feng Zhang, Ryo Tamura, Fanyu Zeng, Daichi Kozawa, Ryo Kitaura. ACS Applied Materials & Interfaces 16 [43] 59109-59115. 2024.https://doi.org/10.1021/acsami.4c15275 Open Access American Chemical Society (ACS) (Publisher) Materials Data Repository (MDR) NIMS author(s)TAMURA, RyoZENG, FanyuKOZAWA, DaichiKITAURA, RyoFulltext and dataset(s) on Materials Data Repository (MDR)MDRavailable Bayesian Optimization for Controlled Chemical Vapor Deposition Growth of WS2 Created at: 2024-11-27 17:35:27 +0900 Updated at: 2026-05-15 04:33:07 +0900
