HOME > Article > DetailBayesian Optimization for Controlled Chemical Vapor Deposition Growth of WS2Feng Zhang, Ryo Tamura, Fanyu Zeng, Daichi Kozawa, Ryo Kitaura. ACS Applied Materials & Interfaces 16 [43] 59109-59115. 2024.https://doi.org/10.1021/acsami.4c15275 NIMS author(s)TAMURA, RyoZENG, FanyuKOZAWA, DaichiKITAURA, RyoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2024-11-27 17:35:27 +0900Updated at: 2025-01-30 04:29:46 +0900