HOME > 論文 > 書誌詳細Oxidation rate and surface-potential variations of silicon during plasma oxidationKITAJIMA, Masahiro, 上岡功, 中村一隆, HISHITA, Shunichi. Physical Review B 3993-3999. 1996.NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2022-09-05 10:49:00 +0900 更新時刻: 2022-09-05 10:49:00 +0900
