単元マグネトロンスパッタ法による膜厚30nmのBi系超伝導薄膜の作製.
(Fabrication of 30nm Thick Superconducting BiSrCaCuO Thin Films by Single-Target Magnetron Sputtering Method.)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2016-05-24 11:33:26 +0900 Updated at: 2018-12-14 22:02:19 +0900