Bias application hard x-ray photoelectron spectroscopy study of forming process of Cu/HfO2/Pt resistive random access memory structure

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Bias application hard x-ray photoelectron spectroscopy study of forming process of Cu/HfO₂/Pt resistive random access memory structure
(Bias application hard x-ray photoelectron spectroscopy study of forming process of Cu/HfO2/Pt resistive random access memory structure)

T. Nagata, M. Haemori, Y. Yamashita, H. Yoshikawa, Y. Iwashita, K. Kobayashi, T. Chikyow.

作成時刻: 2016-05-24 16:33:33 +0900 更新時刻: 2026-10-30 06:35:43 +0900