Bias application hard x-ray photoelectron spectroscopy study of forming process of Cu/HfO2/Pt resistive random access memory structure
(Bias application hard x-ray photoelectron spectroscopy study of forming process of Cu/HfO2/Pt resistive random access memory structure)
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Created at: 2016-05-24 16:33:33 +0900Updated at: 2024-03-31 12:33:21 +0900