HOME > Article > DetailFabrication of diamond in-plane-gated field effect transistors using oxygen plasma etchingTokishige Banno, Minoru Tachiki, Kazushi Nakazawa, Yu Sumikawa, Hitoshi Umezawa, Hiroshi Kawarada. Diamond and Related Materials 12 [3-7] 408-412. 2003.https://doi.org/10.1016/s0925-9635(03)00039-6 NIMS author(s)TACHIKI, MinoruFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 12:02:12 +0900 Updated at: 2026-11-04 05:55:08 +0900
