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Improved transport properties of microcrystalline silicon films grown by HWCVD with a variable hydrogen dilution process
(HWCVD法によりシランの水素希釈率を変化させて作製した微結晶シリコン膜におけるキャリア輸送特性の向上)

NIIKURA, Chisato, Romain Brenot, Joelle Guillet, Jean-Eric Bourée.

THIN SOLID FILMS 568-571. 2008.

NIMS author(s)

NIIKURA, Chisato

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2022-10-21 22:24:54 +0900Updated at: 2022-10-21 22:24:54 +0900

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