HOME > 論文 > 書誌詳細Effects of rf bias and H2 flow rate on the growth of cubic boron nitride films by chemical vapor depositionJ. Yu, S. Matsumoto, K. Okada. Applied Physics A 80 [4] 777-781. 2005.https://doi.org/10.1007/s00339-004-2744-5 NIMS著者岡田 勝行Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 14:41:48 +0900 更新時刻: 2026-09-30 04:15:55 +0900
