Crystallization Kinetics of Water on Bare, Hydrogenated, and Hydroxylated Si(100) and Si(111) Surfaces Studied by RHEED, TOF-SIMS, and TPD | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Crystallization Kinetics of Water on Bare, Hydrogenated, and Hydroxylated Si(100) and Si(111) Surfaces Studied by RHEED, TOF-SIMS, and TPD

Ryutaro Souda, Takashi Aizawa.

The Journal of Physical Chemistry C 123 [33] 20373-20383. 2019.

https://doi.org/10.1021/acs.jpcc.9b05348

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作成時刻: 2019-12-14 03:00:22 +0900更新時刻: 2024-04-02 01:58:42 +0900

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