電子デバイスへ向けた原子層堆積法で作製した金属酸化膜の研究
(Investigation of metal oxide film by atomic layer deposition for electronic device)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2023-04-06 03:59:05 +0900Updated at: 2023-10-10 11:04:25 +0900