Boron distributions in individual core–shell Ge/Si and Si/Ge heterostructured nanowires | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

HOME > 論文 > 書誌詳細

Boron distributions in individual core–shell Ge/Si and Si/Ge heterostructured nanowires
(Ge/SiおよびSi/Geコアシェルナノワイヤ中のボロン原子分布)

Bin Han, Yasuo Shimizu, Jevasuwan Wipakorn, Kotaro Nishibe, Yuan Tu, Koji Inoue, Naoki Fukata, Yasuyoshi Nagai.

Nanoscale 8 [47] 19811-19815. 2016.

https://doi.org/10.1039/c6nr04384d

Open Access Royal Society of Chemistry (RSC) (Publisher)

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2016-12-10 22:54:30 +0900更新時刻: 2024-04-01 22:33:05 +0900

▲ページトップへ移動