Three dimensional nanofabrication by electron-beam-induced deposition using 200-keV electrons in scanning transmission electron microscope | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Three dimensional nanofabrication by electron-beam-induced deposition using 200-keV electrons in scanning transmission electron microscope

Z.Q. Liu, K. Mitsuishi, K. Furuya.

Applied Physics A 80 [7] 1437-1441. 2005.

https://doi.org/10.1007/s00339-004-2999-x

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作成時刻: 2016-05-24 14:42:57 +0900 更新時刻: 2026-08-30 05:04:56 +0900

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